报告题目：After 193i; the next generation nanolithography methods
报告人：王亮 教授
中国科学技术大学
时间地点：2015年3月19日下午 15：00-16：30，教三326
摘要：
The cost for high resolution lithography is very high (more than $60M for a single tool), which is a prohibitive number for many users. As a result, researchers are looking at low cost alternative methods for printing sub-50 nm features. Here Dr. Wang presents two low cost high resolution lithography methods which could become the next generation lithography tool selection: laser direct writing with bowtie aperture and nanoimprint lithography.
Dr. Wang demonstrated that laser direct writing with bowtie aperture could achieve sub-50nm resolution with very low cost. For nanoimprint lithography, patterning resolution has been demonstrated down to 20 nm, with precision overlay/alignment requirements of multilevel device fabrication of better than 10-nm alignment resolution.
简历：
Dr. Wang got his Ph.D. in Mechanical Engineering from Purdue University. He has worked in Molecular Imprints INC, California joined Lam Research Corp etc. Dr. Wang was selected to “1000 Talents Program for Young Scholars” by China in 2013. Dr. Wang’s research interest is nano-optics and nanofabrication. Throughout his career, Dr. Wang has published 22 peer-reviewed papers, which have been cited more than 400 times. Notably, Dr. Wang has successfully transferred many of his research works to industry applications. Some of them are now being used by leading technical companies such as Seagate, Western digital, Toshiba and TSMC.
