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  Current Position£ºHome > LEFT > Research > Nation Research Centers > State Key Laboratory of Modern Optical Instrumentation
State Key Laboratory of Modern Optical Instrumentation

The Laboratory was founded in 1989 under the State approval, and started to open to the outside researchers and public in 1996. The current leadership team includes a Laboratory Director, Prof. LIU Xu, and an Academic Advisory Committee chaired by Prof. ZHUANG Songlin (Academician, Chinese Academy of Engineering)Since the foundation of the Laboratory, it has been constructed into a research base of modern optical instrumentation which has a significant impact both at home and abroad. Focused on photonics and optical engineering, research activities of the laboratory are categorized in three levels: fundamental research, engineering research and industrial applications, with research fields listed below.
 

(1)Low-dimensional photonic structures and micro/nanophotonic devices: Low-dimensional photonic structures including micro/nanofibers, nanowires, quantum dots and plasmonic structures. Light-matter interaction in low-dimensional structures. Micro/nanophotonic components and devices.  

(2)Novel metamaterials: Manipulating evanescent waves to realize subwavelength imaging and ocusing with metamaterials; manipulating optical radiation and receiving with metamaterials; electromagnetic and optical cloaking. Optical properties of plasmonic microstructures and their applications in bioimaging, optical radiation, solar cells. Subwavelength confining and focusing and abnormal transmission of subwavelength holes based on plasmons. 

(3)Biomedical photonics: Light/tissue (cell) interactions at micro to nano-scale for high resolution information and novel contrast mechanism. Biomedical optical instruments using advanced optical and biomedical techniques. In vivo optical imaging and light scattering, including ultra-high resolution optical coherence tomography, angle-resolved light scattering, partial wave spectrum analysis, cell manipulation and sub-cellular imaging.  

(4)Optical Inertia Sensors: Optical sensors for position, motion and acceleration detection based on optical inertia and optical tweezers techniques.

(5)Optical remote imaging: High resolution real-time compensation in motion imaging, image restoration of smaller aperture optical system, image deblur restoration based on motion detection, diffractive/refractive hybrid optical system, imaging system with free form surface, high-precision optical surface detection.  

(6)Precision fabrication and micro/nanoscale detection: Excimer laser micro-fabrication, five-axis precision machining, focused ion beam (FIB) lithography, photo-thermal micro-process, and photo-thermal micro-actuating techniques, novel AFMs (including horizontal AFM, liquid/electrochemical AFM, and large-stage/wide-range AFM, etc), imaging lidar techniques, and other precision fabrication and optoelectronic detecting systems. 

(7)Novel multifunctional integrated optoelectronic devices£ºNovel active and passive optoelectronic devices for optical communication, including high-speed modulated semiconductor lasers, multi-channel wavelength switchable semiconductor lasers, and multifunctional integrated photonic devices for wavelength division multiplexing and fiber access networks. Integrated optoelectronic devices for medical diagnostics and environmental monitoring. 

(8)Novel solid state lasers and fiber lasers: All-fiber high power pulsed fiber lasers, solid state laser and fiber laser working at 2 micron; High power mid-infrared laser working around wavelength from 3 to 5 microns; Periodically poled nonlinear crystals; Novel gain fibers for high power fiber laser application 

(9)Optical and optoelectronic films£º

(a) Optical coating and optoelectronic film devices, including laser coatings with super low optical losses, integrated optical narrow band-pass filters, phase–type optical films for ultrafast optics, wide spectrum tunable filters, ultraviolet and vacuum ultraviolet coatings, as well as organic electroluminescent devices, photoconductive film device, and solar energy photovoltaic cell.

(b) Structure-type thin-film photonic crystal devices, involved in the calculation and fabrication of thin-film photonic band-gap structure for micro- components to be used in omnidirectional reflector, wide angle polarizer, and near-field imaging and so on.

(c)Industry applications of optical coatings and optoelectronic films, especially for digital projection display, plane display and three dimensional display technique as well as digital photograph.

 

Director£ºProf. Xu Liu Tel: 0571-87951576

 

Associate Director£ºProf. Dong Liu Tel: 0571-87951514

 

Associate Director£ºProf. Lan Wu Tel: 0571-87951193

 

Fax: 0517£­87951617

E-mail: moiskl@chinalab.gov.cn